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Information card for entry 4105469
Preview
| Coordinates | 4105469.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C53 H62 Cu Li O2 Si |
|---|---|
| Calculated formula | C53 H62 Cu Li O2 Si |
| SMILES | [Cu]([C]1#[C]([Si](C)(C)C)[Li]1([O]1CCCC1)[O]1CCCC1)c1c2C(CC(c2cc2C(CC(c12)(c1ccccc1)c1ccccc1)(C)C)(C)C)(c1ccccc1)c1ccccc1 |
| Title of publication | Isolated Monomeric and Dimeric Mixed Diorganocuprates Based on the Size-Controllable Bulky "Rind" Ligands |
| Authors of publication | Mikinao Ito; Daisuke Hashizume; Takeo Fukunaga; Tsukasa Matsuo; Kohei Tamao |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2009 |
| Journal volume | 131 |
| Pages of publication | 18024 - 18025 |
| a | 10.8203 ± 0.0015 Å |
| b | 13.1963 ± 0.0019 Å |
| c | 16.471 ± 0.002 Å |
| α | 93.367 ± 0.002° |
| β | 93.257 ± 0.002° |
| γ | 102.391 ± 0.002° |
| Cell volume | 2287.3 ± 0.5 Å3 |
| Cell temperature | 100 K |
| Ambient diffraction temperature | 100 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0685 |
| Residual factor for significantly intense reflections | 0.059 |
| Weighted residual factors for significantly intense reflections | 0.1655 |
| Weighted residual factors for all reflections included in the refinement | 0.1752 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.072 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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