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Information card for entry 4109190
Preview
| Coordinates | 4109190.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C74 H74 Fe P2 Pt S6 |
|---|---|
| Calculated formula | C72 H63 Fe P2 Pt S6.524 |
| SMILES | [Pt]1([P](c2ccccc2)(c2ccccc2)[c]23[Fe]456789%10([c]%11([P]1(c1ccccc1)c1ccccc1)[cH]5[cH]8[cH]%10[cH]9%11)[cH]([cH]7[cH]36)[cH]24)(c1sc(cc1)c1sc(c2sccs2)c(c1CCCC)CCCC)c1sc(c2sc(c3sccs3)c(c2CCCC)CCCC)cc1 |
| Title of publication | A Controlled Approach to Well-Defined Oligothiophenes via Oxidatively Induced Reductive Elimination of Stable Pt(II) Oligothienyl Complexes |
| Authors of publication | Fan Zhang; Peter Bäuerle |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2007 |
| Journal volume | 129 |
| Pages of publication | 3090 - 3091 |
| a | 13.834 ± 0.0017 Å |
| b | 15.171 ± 0.002 Å |
| c | 18.296 ± 0.003 Å |
| α | 108.04 ± 0.016° |
| β | 101.599 ± 0.016° |
| γ | 108.211 ± 0.015° |
| Cell volume | 3274.2 ± 1.1 Å3 |
| Cell temperature | 190 ± 2 K |
| Ambient diffraction temperature | 190 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1073 |
| Residual factor for significantly intense reflections | 0.0536 |
| Weighted residual factors for significantly intense reflections | 0.1077 |
| Weighted residual factors for all reflections included in the refinement | 0.1224 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.81 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4109190.html
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Users of the data should acknowledge the original authors of the
structural data.