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Information card for entry 4111589
Preview
| Coordinates | 4111589.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C40 H89 O3 Si3 Ta |
|---|---|
| Calculated formula | C40 H89 O3 Si3 Ta |
| SMILES | [Ta]1(O[Si](C(C)(C)C)(C(C)(C)C)C(C)(C)C)(O[Si](C(C)(C)C)(C(C)(C)C)C(C)(C)C)(O[Si](C(C)(C)C)(C(C)(C)C)C(C)(C)C)[CH2]=[CH]1CC |
| Title of publication | Thermodynamics, Kinetics, and Mechanism of (silox)3M(olefin) to (silox)3M(alkylidene) Rearrangements (silox =tBu3SiO; M = Nb, Ta) |
| Authors of publication | Kurt F. Hirsekorn; Adam S. Veige; Michael P. Marshak; Yelena Koldobskaya; Peter T. Wolczanski; Thomas R. Cundari; Emil B. Lobkovsky |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2005 |
| Journal volume | 127 |
| Pages of publication | 4809 - 4830 |
| a | 13.115 ± 0.007 Å |
| b | 20.965 ± 0.008 Å |
| c | 17.257 ± 0.006 Å |
| α | 90° |
| β | 91.57 ± 0.02° |
| γ | 90° |
| Cell volume | 4743 ± 4 Å3 |
| Cell temperature | 173 ± 2 K |
| Ambient diffraction temperature | 173 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0608 |
| Residual factor for significantly intense reflections | 0.0344 |
| Weighted residual factors for significantly intense reflections | 0.0755 |
| Weighted residual factors for all reflections included in the refinement | 0.0862 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.008 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4111589.html
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Users of the data should acknowledge the original authors of the
structural data.