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Information card for entry 4112633
Preview
| Coordinates | 4112633.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | [Rb-(2,2,2-crypt)]2(Si5)*4(NH3) |
|---|---|
| Formula | C36 H72 N8 O12 Rb2 Si5 |
| Calculated formula | C36 H72 N8 O12 Rb2 Si5 |
| SMILES | [Si]12[Si]34[Si]5[Si]13[Si]245.[Rb]1234567[N]%12%13CC[O]2CC[O]3CC[N]1(CC[O]5CC[O]4CC%12)CC[O]6CC[O]7CC%13.[Rb]1234567[N]%12%13CC[O]4CC[O]5CC[N]1(CC[O]7CC[O]6CC%12)CC[O]3CC[O]2CC%13.N.N.N.N |
| Title of publication | Naked Deltahedral Silicon Clusters in Solution: Synthesis and Characterization of Si93- and Si52- |
| Authors of publication | Jose M. Goicoechea; Slavi C. Sevov |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2004 |
| Journal volume | 126 |
| Pages of publication | 6860 - 6861 |
| a | 11.1627 ± 0.0019 Å |
| b | 11.863 ± 0.003 Å |
| c | 12.101 ± 0.002 Å |
| α | 119.333 ± 0.003° |
| β | 100.859 ± 0.003° |
| γ | 91.662 ± 0.004° |
| Cell volume | 1358.1 ± 0.5 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 1 |
| Hermann-Mauguin space group symbol | P 1 |
| Hall space group symbol | P 1 |
| Residual factor for all reflections | 0.0931 |
| Residual factor for significantly intense reflections | 0.0705 |
| Weighted residual factors for significantly intense reflections | 0.1713 |
| Weighted residual factors for all reflections included in the refinement | 0.1889 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.005 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4112633.html
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Users of the data should acknowledge the original authors of the
structural data.