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Information card for entry 4117074
Preview
| Coordinates | 4117074.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C21 H50 Mo N4 Si3 |
|---|---|
| Calculated formula | C21 H50 Mo N4 Si3 |
| SMILES | [Mo]123(N([Si](C)(C)C)CC[N]3(CCN1[Si](C)(C)C)CCN2[Si](C)(C)C)C1CCCCC1 |
| Title of publication | Synthesis and Decomposition of Alkyl Complexes of Molybdenum(IV) That Contain a [(Me3SiNCH2CH2)3N]3- Ligand. Direct Detection of α-Elimination Processes That Are More than Six Orders of Magnitude Faster than β-Elimination Processes |
| Authors of publication | Richard R. Schrock; Scott W. Seidel; Nadia C. Mösch-Zanetti; Keng-Yu Shih; Myra B. O'Donoghue; William M. Davis; William M. Reiff |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 1997 |
| Journal volume | 119 |
| Pages of publication | 11876 - 11893 |
| a | 20.82 ± 0.006 Å |
| b | 20.82 ± 0.006 Å |
| c | 11.68 ± 0.005 Å |
| α | 90° |
| β | 90° |
| γ | 120° |
| Cell volume | 4385 ± 3 Å3 |
| Cell temperature | 183 ± 2 K |
| Ambient diffraction temperature | 183 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 173 |
| Hermann-Mauguin space group symbol | P 63 |
| Hall space group symbol | P 6c |
| Residual factor for all reflections | 0.067 |
| Residual factor for significantly intense reflections | 0.0569 |
| Weighted residual factors for all reflections | 0.1702 |
| Weighted residual factors for significantly intense reflections | 0.1488 |
| Goodness-of-fit parameter for all reflections | 1.113 |
| Goodness-of-fit parameter for significantly intense reflections | 1.142 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4117074.html
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Users of the data should acknowledge the original authors of the
structural data.