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Information card for entry 4117689
Preview
| Coordinates | 4117689.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C43.5 H55 Cl4 Ge2 N3 |
|---|---|
| Calculated formula | C43.5 H55 Cl4 Ge2 N3 |
| SMILES | [Ge]12(Cl)[n]3c(cccc3C(=[N]1c1c(cccc1C(C)C)C(C)C)C)C(=[N]2c1c(cccc1C(C)C)C(C)C)C.[Ge](Cl)(Cl)[Cl-].c1(ccccc1)C.Cc1ccccc1 |
| Title of publication | Lewis Base Mediated Autoionization of GeCl2 and SnCl2 |
| Authors of publication | Amit Pratap Singh; Herbert W. Roesky; Elena Carl; Dietmar Stalke; Jean-Philippe Demers; Adam Lange |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2012 |
| Journal volume | 134 |
| Pages of publication | 4998 - 5003 |
| a | 10.33 ± 0.003 Å |
| b | 13.013 ± 0.003 Å |
| c | 16.873 ± 0.007 Å |
| α | 93.66 ± 0.02° |
| β | 97.33 ± 0.02° |
| γ | 103.26 ± 0.02° |
| Cell volume | 2179.4 ± 1.2 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0332 |
| Residual factor for significantly intense reflections | 0.0253 |
| Weighted residual factors for significantly intense reflections | 0.055 |
| Weighted residual factors for all reflections included in the refinement | 0.0569 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.045 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4117689.html
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