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Information card for entry 4118776
Preview
| Coordinates | 4118776.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C39 H59 B N2 O2 P2 Si2 Yb |
|---|---|
| Calculated formula | C39 H59 B N2 O2 P2 Si2 Yb |
| SMILES | C1=P(c2ccccc2)(c2ccccc2)N([Si](C)(C)C)[Yb]([H][BH3])([N]([Si](C)(C)C)=P1(c1ccccc1)c1ccccc1)([O]1CCCC1)[O]1CCCC1 |
| Title of publication | [Ln(BH4)2(THF)2] (Ln = Eu, Yb)-A Highly Luminescent Material. Synthesis, Properties, Reactivity, and NMR Studies |
| Authors of publication | Sebastian Marks; Joachim G. Heck; Marija H. Habicht; Pascual Oña-Burgos; Claus Feldmann; Peter W. Roesky |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2012 |
| Journal volume | 134 |
| Pages of publication | 16983 - 16986 |
| a | 10.104 ± 0.002 Å |
| b | 11.976 ± 0.002 Å |
| c | 18.965 ± 0.004 Å |
| α | 79.88 ± 0.03° |
| β | 89.61 ± 0.03° |
| γ | 70.33 ± 0.03° |
| Cell volume | 2123.9 ± 0.9 Å3 |
| Cell temperature | 153 ± 2 K |
| Ambient diffraction temperature | 153 ± 2 K |
| Number of distinct elements | 8 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0527 |
| Residual factor for significantly intense reflections | 0.0446 |
| Weighted residual factors for significantly intense reflections | 0.1072 |
| Weighted residual factors for all reflections included in the refinement | 0.1099 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.985 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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