Information card for entry 4124890
| Formula |
C16 H3 F20 I O2 |
| Calculated formula |
C16 H3 F20 I O2 |
| SMILES |
[I]12c3c(cccc3C(O1)(C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)F)C(O2)(C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)F |
| Title of publication |
Isolation of Hypervalent Group-16 Radicals and Their Application in Organic-Radical Batteries. |
| Authors of publication |
Imada, Yasuyuki; Nakano, Hideyuki; Furukawa, Ko; Kishi, Ryohei; Nakano, Masayoshi; Maruyama, Hitoshi; Nakamoto, Masaaki; Sekiguchi, Akira; Ogawa, Masahiro; Ohta, Toshiaki; Yamamoto, Yohsuke |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2016 |
| Journal volume |
138 |
| Journal issue |
2 |
| Pages of publication |
479 - 482 |
| a |
8.495 ± 0.005 Å |
| b |
9.151 ± 0.005 Å |
| c |
13.099 ± 0.007 Å |
| α |
94.05 ± 0.006° |
| β |
90.403 ± 0.006° |
| γ |
90.57 ± 0.006° |
| Cell volume |
1015.7 ± 1 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0858 |
| Residual factor for significantly intense reflections |
0.0728 |
| Weighted residual factors for significantly intense reflections |
0.2446 |
| Weighted residual factors for all reflections included in the refinement |
0.2954 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.236 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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