Information card for entry 4127775
| Common name |
LaNiSiH1.50 |
| Chemical name |
LaNiSiH1.50 |
| Formula |
H1.5 La Ni Si |
| Calculated formula |
H1.472 La Ni Si |
| Title of publication |
Zeolitic Intermetallics: LnNiSi (Ln = La-Nd). |
| Authors of publication |
Mizoguchi, Hiroshi; Park, Sang-Won; Kishida, Kazuhisa; Kitano, Masaaki; Kim, Junghwan; Sasase, Masato; Honda, Takashi; Ikeda, Kazutaka; Otomo, Toshiya; Hosono, Hideo |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2019 |
| Journal volume |
141 |
| Journal issue |
8 |
| Pages of publication |
3376 - 3379 |
| a |
4.18488 ± 0.00007 Å |
| b |
4.18488 ± 0.00007 Å |
| c |
14.5659 ± 0.0004 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
255.096 ± 0.009 Å3 |
| Cell temperature |
300 K |
| Ambient diffraction temperature |
300 K |
| Number of distinct elements |
4 |
| Space group number |
109 |
| Hermann-Mauguin space group symbol |
I 41 m d |
| Hall space group symbol |
I 4bw -2 |
| Residual factor R(I) for significantly intense reflections |
0.069525 |
| Goodness-of-fit parameter for all reflections |
0.236 |
| Method of determination |
powder diffraction |
| Diffraction radiation type |
TOFNeutronDiffraction |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4127775.html