Information card for entry 4129436
| Formula |
C42 H42 B F20 P Si |
| Calculated formula |
C42 H42 B F20 P Si |
| SMILES |
C(C)(C)(C)[P+](C(C)(C)C)(C(C)(C)C)[Si](CC)(CC)CC.c1(c(c(c(c(c1F)F)F)F)F)[B-](c1c(c(c(c(c1F)F)F)F)F)(c1c(c(c(c(c1F)F)F)F)F)c1c(c(c(c(c1F)F)F)F)F |
| Title of publication |
1,2-Diphosphonium dication: a strong P-based Lewis acid in frustrated lewis pair (FLP)-activations of B-H, Si-H, C-H, and H-H bonds. |
| Authors of publication |
Holthausen, Michael H.; Bayne, Julia M.; Mallov, Ian; Dobrovetsky, Roman; Stephan, Douglas W. |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2015 |
| Journal volume |
137 |
| Journal issue |
23 |
| Pages of publication |
7298 - 7301 |
| a |
10.63 ± 0.007 Å |
| b |
14.322 ± 0.009 Å |
| c |
14.665 ± 0.011 Å |
| α |
91.75 ± 0.02° |
| β |
93.43 ± 0.02° |
| γ |
100.84 ± 0.02° |
| Cell volume |
2187 ± 3 Å3 |
| Cell temperature |
254 ± 2 K |
| Ambient diffraction temperature |
254 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0596 |
| Residual factor for significantly intense reflections |
0.0446 |
| Weighted residual factors for significantly intense reflections |
0.1373 |
| Weighted residual factors for all reflections included in the refinement |
0.152 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.052 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4129436.html