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Information card for entry 4129487
Preview
| Coordinates | 4129487.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C33 H39 N O3 Si |
|---|---|
| Calculated formula | C33 N O3 Si |
| SMILES | [Si](Oc1ccc(c2c(cccc2)C#N)cc1)(C(C)C)(Cc1ccc(cc1)/C=C/C(=O)OCCCC)C(C)C |
| Title of publication | Remote para-C-H Functionalization of Arenes by a D-Shaped Biphenyl Template-Based Assembly. |
| Authors of publication | Bag, Sukdev; Patra, Tuhin; Modak, Atanu; Deb, Arghya; Maity, Soham; Dutta, Uttam; Dey, Aniruddha; Kancherla, Rajesh; Maji, Arun; Hazra, Avijit; Bera, Milan; Maiti, Debabrata |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2015 |
| Journal volume | 137 |
| Journal issue | 37 |
| Pages of publication | 11888 - 11891 |
| a | 7.82 ± 0.005 Å |
| b | 12.203 ± 0.006 Å |
| c | 16.271 ± 0.012 Å |
| α | 94.02 ± 0.06° |
| β | 103.1 ± 0.07° |
| γ | 103.67 ± 0.07° |
| Cell volume | 1456.9 ± 1.7 Å3 |
| Cell temperature | 100 K |
| Ambient diffraction temperature | 100 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.1589 |
| Residual factor for significantly intense reflections | 0.1457 |
| Weighted residual factors for significantly intense reflections | 0.4045 |
| Weighted residual factors for all reflections included in the refinement | 0.4279 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.63 |
| Diffraction radiation wavelength | 1.54187 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4129487.html
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Users of the data should acknowledge the original authors of the
structural data.