Information card for entry 4133903
| Formula |
C19 H19 F2 N O4 Si |
| Calculated formula |
C19 H19 F2 N O4 Si |
| SMILES |
[Si](c1ccccc1)([C@@H](COC(=O)c1ccc(N(=O)=O)cc1)C=C(F)F)(C)C |
| Title of publication |
Catalytic Enantioselective Boryl and Silyl Substitution with Trifluoromethyl Alkenes: Scope, Utility, and Mechanistic Nuances of Cu-F β-Elimination. |
| Authors of publication |
Paioti, Paulo H. S.; Del Pozo, Juan; Mikus, Malte S.; Lee, Jaehee; Koh, Ming Joo; Romiti, Filippo; Torker, Sebastian; Hoveyda, Amir H. |
| Journal of publication |
Journal of the American Chemical Society |
| Year of publication |
2019 |
| Journal volume |
141 |
| Journal issue |
50 |
| Pages of publication |
19917 - 19934 |
| a |
6.6591 ± 0.0003 Å |
| b |
7.0377 ± 0.0003 Å |
| c |
41.661 ± 0.0016 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
1952.43 ± 0.14 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
6 |
| Space group number |
19 |
| Hermann-Mauguin space group symbol |
P 21 21 21 |
| Hall space group symbol |
P 2ac 2ab |
| Residual factor for all reflections |
0.0422 |
| Residual factor for significantly intense reflections |
0.0388 |
| Weighted residual factors for significantly intense reflections |
0.1 |
| Weighted residual factors for all reflections included in the refinement |
0.1025 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.047 |
| Diffraction radiation wavelength |
1.54178 Å |
| Diffraction radiation type |
CuKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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