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Information card for entry 4134843
Preview
| Coordinates | 4134843.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C27 H36 Mn N O P S3 Si3 |
|---|---|
| Calculated formula | C27 H36 Mn N O P S3 Si3 |
| SMILES | [Mn]123(Sc4c([P]3(c3cccc([Si](C)(C)C)c3S1)c1cccc([Si](C)(C)C)c1S2)cccc4[Si](C)(C)C)N=O |
| Title of publication | Photoinduced NO and HNO Production from Mononuclear {FeNO}<sup>6</sup> Complex Bearing a Pendant Thiol. |
| Authors of publication | Chiang, Chuan-Kuei; Chu, Kai-Ti; Lin, Chia-Chin; Xie, Shi-Rou; Liu, Yu-Chiao; Demeshko, Serhiy; Lee, Gene-Hsiang; Meyer, Franc; Tsai, Ming-Li; Chiang, Ming-Hsi; Lee, Chien-Ming |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2020 |
| a | 11.2716 ± 0.0003 Å |
| b | 14.8244 ± 0.0004 Å |
| c | 19.6616 ± 0.0006 Å |
| α | 90° |
| β | 90.5417 ± 0.0009° |
| γ | 90° |
| Cell volume | 3285.2 ± 0.16 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 8 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0404 |
| Residual factor for significantly intense reflections | 0.0306 |
| Weighted residual factors for significantly intense reflections | 0.0747 |
| Weighted residual factors for all reflections included in the refinement | 0.0823 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.054 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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