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Information card for entry 4135101
Preview
| Coordinates | 4135101.cif |
|---|---|
| Original paper (by DOI) | HTML |
| External links | PubChem |
| Formula | C134 H128 O18 P4 Rh2 |
|---|---|
| Calculated formula | C134 H128 O18 P4 Rh2 |
| SMILES | [Rh]1234([Rh]([O]=P5(O1)Oc1c6C7(CCc6cc(c1)c1cc(cc(c1)C)C)c1c(O5)cc(cc1CC7)c1cc(cc(c1)C)C)([O]=P1(O2)Oc2c5C6(CCc5cc(c2)c2cc(cc(c2)C)C)c2c(O1)cc(cc2CC6)c1cc(cc(c1)C)C)(OP1(=[O]3)Oc2c3C5(CCc3cc(c2)c2cc(cc(c2)C)C)c2c(O1)cc(cc2CC5)c1cc(cc(c1)C)C)(OP1(=[O]4)Oc2c3C4(CCc3cc(c2)c2cc(cc(c2)C)C)c2c(O1)cc(cc2CC4)c1cc(cc(c1)C)C)[OH]C)[OH]C |
| Title of publication | Enantioselective Diarylcarbene Insertion into Si-H Bonds Induced by Electronic Properties of the Carbenes. |
| Authors of publication | Yang, Liang-Liang; Evans, Declan; Xu, Bin; Li, Wen-Tao; Li, Mao-Lin; Zhu, Shou-Fei; Houk, K. N.; Zhou, Qi-Lin |
| Journal of publication | Journal of the American Chemical Society |
| Year of publication | 2020 |
| a | 14.423 ± 0.003 Å |
| b | 28.903 ± 0.006 Å |
| c | 31.726 ± 0.006 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 13226 ± 5 Å3 |
| Cell temperature | 127.15 K |
| Ambient diffraction temperature | 127.15 K |
| Number of distinct elements | 5 |
| Space group number | 19 |
| Hermann-Mauguin space group symbol | P 21 21 21 |
| Hall space group symbol | P 2ac 2ab |
| Residual factor for all reflections | 0.1192 |
| Residual factor for significantly intense reflections | 0.1017 |
| Weighted residual factors for significantly intense reflections | 0.2024 |
| Weighted residual factors for all reflections included in the refinement | 0.2163 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.125 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4135101.html
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