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Information card for entry 4300025
Preview
| Coordinates | 4300025.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C99.37 H10.74 Bi8 Cl6.74 F80 O22 |
|---|---|
| Calculated formula | C99.38 H10.76 Bi8 Cl6.76 F80 O22 |
| Title of publication | Oligomerization and Oxide Formation in Bismuth Aryl Alkoxides: Synthesis and Characterization of Bi4(μ4-O)(μ-OC6F5)6{μ3-OBi(μ-OC6F5)3}2(C6H5CH3), Bi8(μ4-O)2(μ3-O)2(μ-OC6F5)16, Bi6(μ3-O)4(μ3-OC6F5){μ3-OBi(OC6F5)4}3, NaBi4(μ3-O)2(OC6F5)9(THF)2, and Na2Bi4(μ3-O)2(OC6F5)10(THF)2 |
| Authors of publication | Kenton H. Whitmire; Silke Hoppe; Orson Sydora; Jennifer L. Jolas; Carolyn M. Jones |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2000 |
| Journal volume | 39 |
| Pages of publication | 85 - 97 |
| a | 14.292 ± 0.003 Å |
| b | 15.111 ± 0.003 Å |
| c | 17.545 ± 0.004 Å |
| α | 112.19 ± 0.03° |
| β | 104.46 ± 0.03° |
| γ | 100.58 ± 0.03° |
| Cell volume | 3230 ± 1.8 Å3 |
| Cell temperature | 193 ± 2 K |
| Ambient diffraction temperature | 123 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.056 |
| Residual factor for significantly intense reflections | 0.0397 |
| Weighted residual factors for all reflections | 0.1015 |
| Weighted residual factors for significantly intense reflections | 0.0931 |
| Goodness-of-fit parameter for all reflections | 1.048 |
| Goodness-of-fit parameter for significantly intense reflections | 1.089 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4300025.html
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Users of the data should acknowledge the original authors of the
structural data.