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Information card for entry 4308375
Preview
| Coordinates | 4308375.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C46 H78 N S3 Si6 V |
|---|---|
| Calculated formula | C46 H78 N S3 Si6 V |
| SMILES | [V](Sc1c([Si](C)(C)C)cccc1[Si](C)(C)C)(Sc1c([Si](C)(C)C)cccc1[Si](C)(C)C)(Sc1c([Si](C)(C)C)cccc1[Si](C)(C)C)=NC12CC3CC(C1)CC(C2)C3 |
| Title of publication | Synthesis of a Vanadium(III) Tris(arylthiolato) Complex and Its Reactions with Azide and Azo Compounds: Formation of a Sulfenamide Complex via Cleavage of an Azo NN Bond |
| Authors of publication | Komuro, Takashi; Matsuo, Tsukasa; Kawaguchi, Hiroyuki; Tatsumi, Kazuyuki |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2005 |
| Journal volume | 44 |
| Journal issue | 2 |
| Pages of publication | 175 - 177 |
| a | 12.295 ± 0.003 Å |
| b | 16.438 ± 0.004 Å |
| c | 27.386 ± 0.007 Å |
| α | 90° |
| β | 99.814 ± 0.003° |
| γ | 90° |
| Cell volume | 5454 ± 2 Å3 |
| Cell temperature | 173.1 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for significantly intense reflections | 0.055 |
| Weighted residual factors for all reflections included in the refinement | 0.154 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.001 |
| Diffraction radiation wavelength | 0.7107 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4308375.html
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