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Information card for entry 4312840
Preview
| Coordinates | 4312840.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C42 H56 N10 O2 Ru2 |
|---|---|
| Calculated formula | C42 H56 N10 O2 Ru2 |
| SMILES | OCC.C(#N)[Ru]1234[N](=C(c5ccccc5)N(C)[Ru]4(C#N)([N](=C(c4ccccc4)N2C)C)(N(C(=[N]1C)c1ccccc1)C)[N](=C(N3C)c1ccccc1)C)C.OCC |
| Title of publication | Synthesis and Characterization of Ru2(DMBA)4X2 (X = CN, N3, N(CN)2, I): Controlling Structural, Redox, and Magnetic Properties with Axial Ligands |
| Authors of publication | Wei-Zhong Chen; Tong Ren |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2003 |
| Journal volume | 42 |
| Pages of publication | 8847 - 8852 |
| a | 18.005 ± 0.005 Å |
| b | 13.995 ± 0.004 Å |
| c | 18.665 ± 0.006 Å |
| α | 90° |
| β | 104.802 ± 0.005° |
| γ | 90° |
| Cell volume | 4547 ± 2 Å3 |
| Cell temperature | 300 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0692 |
| Residual factor for significantly intense reflections | 0.0459 |
| Weighted residual factors for significantly intense reflections | 0.1012 |
| Weighted residual factors for all reflections included in the refinement | 0.1052 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.013 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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