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Information card for entry 4321226
Preview
| Coordinates | 4321226.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | Compound 8a |
|---|---|
| Formula | C8 H15 N2 S3 V |
| Calculated formula | C8 H15 N2 S3 V |
| SMILES | [V]123(SCC[N]3(CCS1)CCS2)[N]#CC |
| Title of publication | Vanadium Complexes of the N(CH2CH2S)33- and O(CH2CH2S)22- Ligands with Coligands Relevant to Nitrogen Fixation Processes |
| Authors of publication | Sian C. Davies; David L. Hughes; Zofia Janas; Lucjan B. Jerzykiewicz; Raymond L. Richards; J. Roger Sanders; James E. Silverston; Piotr Sobota |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2000 |
| Journal volume | 39 |
| Pages of publication | 3485 - 3498 |
| a | 11.787 ± 0.002 Å |
| b | 12.09 ± 0.003 Å |
| c | 17.576 ± 0.004 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 2504.7 ± 0.9 Å3 |
| Cell temperature | 300 ± 2 K |
| Ambient diffraction temperature | 300 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 61 |
| Hermann-Mauguin space group symbol | P b c a |
| Hall space group symbol | -P 2ac 2ab |
| Residual factor for all reflections | 0.0372 |
| Residual factor for significantly intense reflections | 0.0308 |
| Weighted residual factors for all reflections | 0.0855 |
| Weighted residual factors for significantly intense reflections | 0.0826 |
| Goodness-of-fit parameter for all reflections | 1.121 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4321226.html
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