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Information card for entry 4321233
Preview
| Coordinates | 4321233.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Common name | Compound 16 |
|---|---|
| Formula | C19 H34 N O2 S2 Si V |
| Calculated formula | C19 H34 N O2 S2 Si V |
| SMILES | [V]12(SCC[O]2CCS1)(Oc1c(cccc1C(C)C)C(C)C)=N[Si](C)(C)C |
| Title of publication | Vanadium Complexes of the N(CH2CH2S)33- and O(CH2CH2S)22- Ligands with Coligands Relevant to Nitrogen Fixation Processes |
| Authors of publication | Sian C. Davies; David L. Hughes; Zofia Janas; Lucjan B. Jerzykiewicz; Raymond L. Richards; J. Roger Sanders; James E. Silverston; Piotr Sobota |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2000 |
| Journal volume | 39 |
| Pages of publication | 3485 - 3498 |
| a | 9.646 ± 0.002 Å |
| b | 10.103 ± 0.002 Å |
| c | 15.001 ± 0.003 Å |
| α | 91.06 ± 0.03° |
| β | 102.12 ± 0.03° |
| γ | 118.16 ± 0.03° |
| Cell volume | 1248.4 ± 0.6 Å3 |
| Cell temperature | 302 ± 2 K |
| Ambient diffraction temperature | 302 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0601 |
| Residual factor for significantly intense reflections | 0.0516 |
| Weighted residual factors for all reflections | 0.1719 |
| Weighted residual factors for significantly intense reflections | 0.1653 |
| Goodness-of-fit parameter for all reflections | 1.12 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4321233.html
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Users of the data should acknowledge the original authors of the
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