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Information card for entry 4321789
Preview
| Coordinates | 4321789.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | {[Cu(CH2(C6H4-4-NH2)2)(CH2(COOH)2)Cl]Cl}2 |
|---|---|
| Formula | C16 H18 Cl2 Cu N2 O4 |
| Calculated formula | C16 H18 Cl2 Cu N2 O4 |
| SMILES | [Cu]1(Cl)([O]=C(O)CC(=[O]1)O)[NH2]c1ccc(cc1)Cc1ccc(N)cc1.[Cl-] |
| Title of publication | New Maze-Type Network Assembled by Copper(II) and 4,4'-Diaminodiphenylmethane: {[Cu(C13H14N2)(C3H4O4)Cl]Cl}2 |
| Authors of publication | Yugen Zhang; Masayoshi Nishiura; Li Jianmin; Deng Wei; Tsuneo Imamoto |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 1999 |
| Journal volume | 38 |
| Pages of publication | 825 - 827 |
| a | 9.834 ± 0.002 Å |
| b | 11.871 ± 0.005 Å |
| c | 15.368 ± 0.008 Å |
| α | 90° |
| β | 106.833 ± 0.003° |
| γ | 90° |
| Cell volume | 1717.2 ± 1.2 Å3 |
| Cell temperature | 298 ± 1 K |
| Ambient diffraction temperature | 293 ± 1 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/a 1 |
| Hall space group symbol | -P 2yab |
| Residual factor for all reflections | 0.089 |
| Residual factor for significantly intense reflections | 0.089 |
| Weighted residual factors for all reflections | 0.125 |
| Weighted residual factors for significantly intense reflections | 0.125 |
| Goodness-of-fit parameter for significantly intense reflections | 5.26 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4321789.html
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