Information card for entry 4326399

Structure parameters

• Formula: C82 H79 B F15 N2 O4 Si U
• Calculated formula: C82 H79 B F15 N2 O4 Si U
• SMILES: [U]12(O[B](c3c(F)c(F)c(F)c(F)c3F)(c3c(F)c(F)c(F)c(F)c3F)c3c(F)c(F)c(F)c(F)c3F)(O[Si](CC)(CC)CC)(OC(=CC(=[N]2c2cc(cc(c2)C(C)(C)C)C(C)(C)C)c2ccccc2)c2ccccc2)OC(=CC(=[N]1c1cc(cc(c1)C(C)(C)C)C(C)(C)C)c1ccccc1)c1ccccc1
• Title of publication: Silylation of the Uranyl Ion Using B(C6F5)3-Activated Et3SiH
• Authors of publication: David D. Schnaars; Guang Wu; Trevor W. Hayton
• Journal of publication: Inorganic Chemistry
• Year of publication: 2011
• Journal volume: 50
• Pages of publication: 9642 - 9649
• a: 12.909 ± 0.004 Å
• b: 16.329 ± 0.005 Å
• c: 19.01 ± 0.006 Å
• α: 78.273 ± 0.005°
• β: 87.803 ± 0.005°
• γ: 71.991 ± 0.006°
• Cell volume: 3730 ± 2 ų
• Cell temperature: 150 ± 2 K
• Ambient diffraction temperature: 150 ± 2 K
• Number of distinct elements: 8
• Space group number: 2
• Hermann-Mauguin space group symbol: P -1
• Hall space group symbol: -P 1
• Residual factor for all reflections: 0.121
• Residual factor for significantly intense reflections: 0.0783
• Weighted residual factors for significantly intense reflections: 0.137
• Weighted residual factors for all reflections included in the refinement: 0.1507
• Goodness-of-fit parameter for all reflections included in the refinement: 1.126
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No