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Information card for entry 4327008
Preview
| Coordinates | 4327008.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H60 Hf2 N12 Si2 |
|---|---|
| Calculated formula | C20 H60 Hf2 N12 Si2 |
| SMILES | CN(C)[Hf]12(N(C)C)N([Si]([N]1(C)C)(N(C)C)N(C)C)[Hf]1(N(C)C)(N(C)C)N2[Si]([N]1(C)C)(N(C)C)N(C)C |
| Title of publication | Synthesis, Characterization, and Materials Chemistry of Group 4 Silylimides |
| Authors of publication | Samuel D. Cosham; Andrew L. Johnson; Kieran C. Molloy; Andrew J. Kingsley |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2011 |
| Journal volume | 50 |
| Pages of publication | 12053 - 12063 |
| a | 8.993 ± 0.0002 Å |
| b | 13.928 ± 0.0003 Å |
| c | 13.729 ± 0.0003 Å |
| α | 90° |
| β | 101.626 ± 0.001° |
| γ | 90° |
| Cell volume | 1684.34 ± 0.06 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0508 |
| Residual factor for significantly intense reflections | 0.0277 |
| Weighted residual factors for significantly intense reflections | 0.0481 |
| Weighted residual factors for all reflections included in the refinement | 0.0527 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.998 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4327008.html
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