Information card for entry 4331981
| Formula |
C18 H42 N4 O24 V3 |
| Calculated formula |
C18 H42 N4 O24 V3 |
| SMILES |
C([N]12[V]34([N](CC(=O)O3)(CC(=O)O4)CC1)(OC(=O)C2)=O)C[N]12CC[N]34CC(=O)O[V]24(OC(=O)C3)(OC(=O)C1)=O.[OH2][V](O)([OH2])([OH2])(O)[OH2].O.O.O.O |
| Title of publication |
Construction of 3d−4f Mixed-Metal Complexes Based on a Binuclear Oxovanadium Unit: Synthesis, Crystal Structure, EPR, and Magnetic Properties |
| Authors of publication |
Shi, Wei; Chen, Xiao-Yan; Zhao, Bin; Yu, Ao; Song, Hai-Bin; Cheng, Peng; Wang, Hong-Gen; Liao, Dai-Zheng; Yan, Shi-Ping |
| Journal of publication |
Inorganic Chemistry |
| Year of publication |
2006 |
| Journal volume |
45 |
| Journal issue |
10 |
| Pages of publication |
3949 - 3957 |
| a |
6.879 ± 0.002 Å |
| b |
21.636 ± 0.007 Å |
| c |
11.043 ± 0.003 Å |
| α |
90° |
| β |
95.128 ± 0.005° |
| γ |
90° |
| Cell volume |
1637 ± 0.8 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
14 |
| Hermann-Mauguin space group symbol |
P 1 21/n 1 |
| Hall space group symbol |
-P 2yn |
| Residual factor for all reflections |
0.0764 |
| Residual factor for significantly intense reflections |
0.0474 |
| Weighted residual factors for significantly intense reflections |
0.0862 |
| Weighted residual factors for all reflections included in the refinement |
0.0945 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.077 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4331981.html