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Information card for entry 4333171
Preview
| Coordinates | 4333171.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H29 F6 N4 O3 P Ru S |
|---|---|
| Calculated formula | C28 H23 F6 N4 O2 P Ru S |
| SMILES | [Ru]123([S](c4ccccc4C(=O)O1)C)([n]1ccccc1c1[n]2cccc1)[n]1ccccc1c1[n]3cccc1.[P](F)(F)(F)(F)(F)[F-] |
| Title of publication | Phototriggered S →O Isomerization of a Ruthenium-Bound Chelating Sulfoxide |
| Authors of publication | Butcher, Jr., Dennis P.; Rachford, Aaron A.; Petersen, Jeffrey L.; Rack, Jeffrey J. |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2006 |
| Journal volume | 45 |
| Journal issue | 23 |
| Pages of publication | 9178 - 9180 |
| a | 7.5614 ± 0.0013 Å |
| b | 13.812 ± 0.003 Å |
| c | 15.969 ± 0.003 Å |
| α | 92.233 ± 0.003° |
| β | 92.176 ± 0.003° |
| γ | 103.673 ± 0.003° |
| Cell volume | 1617.4 ± 0.5 Å3 |
| Cell temperature | 295 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 8 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0697 |
| Residual factor for significantly intense reflections | 0.047 |
| Weighted residual factors for significantly intense reflections | 0.1146 |
| Weighted residual factors for all reflections included in the refinement | 0.1225 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.966 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4333171.html
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