Information card for entry 4339981

Structure parameters

• Formula: C54 H57 N O9 Sb3 Si2
• Calculated formula: C54 H55 N O9 Sb3 Si2
• SMILES: [Sb]123([O]4[Sb]5(O1)(O[Sb]4(O2)(O[Si](O5)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1)(O[Si](O3)(c1ccccc1)c1ccccc1)c1ccccc1)(c1ccccc1)[O-].[NH+](CC)(CC)CC
• Title of publication: Hexa- and trinuclear organoantimony oxo clusters stabilized by organosilanols.
• Authors of publication: Kishore, Pilli V. V. N.; Baskar, Viswanathan
• Journal of publication: Inorganic chemistry
• Year of publication: 2014
• Journal volume: 53
• Journal issue: 13
• Pages of publication: 6737 - 6742
• a: 18.9322 ± 0.0015 Å
• b: 28.524 ± 0.002 Å
• c: 24.7911 ± 0.0019 Å
• α: 90°
• β: 102.755 ± 0.001°
• γ: 90°
• Cell volume: 13057.4 ± 1.7 ų
• Cell temperature: 273 ± 2 K
• Ambient diffraction temperature: 273 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.1002
• Residual factor for significantly intense reflections: 0.0853
• Weighted residual factors for significantly intense reflections: 0.2457
• Weighted residual factors for all reflections included in the refinement: 0.2594
• Goodness-of-fit parameter for all reflections included in the refinement: 1.095
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No