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Information card for entry 4340237
Preview
| Coordinates | 4340237.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C22 H14 N10 Ni2 S8 |
|---|---|
| Calculated formula | C22 H14 N10 Ni2 S8 |
| SMILES | [Ni]12(SC(=C(S2)C#N)C#N)SC(=C(S1)C#N)C#N.[Ni]12(SC(=C(S1)C#N)C#N)SC(=C(S2)C#N)C#N.[NH+]12CC[NH+](CC1)CC2 |
| Title of publication | Design of a magnetic bistability molecular system constructed by H-bonding and pi...pi-stacking interactions. |
| Authors of publication | Ren, X. M.; Nishihara, S.; Akutagawa, T.; Noro, S.; Nakamura, T. |
| Journal of publication | Inorganic chemistry |
| Year of publication | 2006 |
| Journal volume | 45 |
| Journal issue | 5 |
| Pages of publication | 2229 - 2234 |
| a | 9.972 ± 0.005 Å |
| b | 10.022 ± 0.004 Å |
| c | 15.416 ± 0.008 Å |
| α | 70.825 ± 0.015° |
| β | 78.295 ± 0.018° |
| γ | 87.343 ± 0.017° |
| Cell volume | 1424.6 ± 1.2 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0574 |
| Residual factor for significantly intense reflections | 0.0447 |
| Weighted residual factors for significantly intense reflections | 0.1299 |
| Weighted residual factors for all reflections included in the refinement | 0.1675 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.062 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4340237.html
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