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Information card for entry 4342597
Preview
| Coordinates | 4342597.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C46 H64 Al N4 V |
|---|---|
| Calculated formula | C46 H64 Al N4 V |
| SMILES | [V]1([N](=C(C)C=C(N1c1c(cccc1C(C)C)C(C)C)C)c1c(cccc1C(C)C)C(C)C)(N(c1ccc(cc1)C)c1ccc(cc1)C)=N[Al](C)(C)C |
| Title of publication | Addition of Si‒H and B‒H Bonds and Redox Reactivity Involving Low-Coordinate Nitrido‒Vanadium Complexes |
| Authors of publication | Thompson, Rick; Tran, Ba L.; Ghosh, Soumya; Chen, Chun-Hsing; Pink, Maren; Gao, Xinfeng; Carroll, Patrick J.; Baik, Mu-Hyun; Mindiola, Daniel J. |
| Journal of publication | Inorganic Chemistry |
| Year of publication | 2015 |
| Pages of publication | 150302094058008 |
| a | 13.089 ± 0.0006 Å |
| b | 17.6638 ± 0.0007 Å |
| c | 19.2166 ± 0.0008 Å |
| α | 90° |
| β | 100.346 ± 0.001° |
| γ | 90° |
| Cell volume | 4370.7 ± 0.3 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.0754 |
| Residual factor for significantly intense reflections | 0.0535 |
| Weighted residual factors for significantly intense reflections | 0.1534 |
| Weighted residual factors for all reflections included in the refinement | 0.177 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.137 |
| Diffraction radiation wavelength | 0.41328 Å |
| Diffraction radiation type | synchrotron |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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Users of the data should acknowledge the original authors of the
structural data.