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Information card for entry 4343699
Preview
| Coordinates | 4343699.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C42 H30 Cl6 N4 Pd2 S4 |
|---|---|
| Calculated formula | C42 H30 Cl6 N4 Pd2 S4 |
| SMILES | c12c(cccc2)C=[N]2c3cccc([N]4=Cc5c(S[Pd]64[N](=Cc4c(cccc4)S6)c4cc([N]6=Cc7c(S[Pd]26S1)cccc7)ccc4)cccc5)c3.C(Cl)(Cl)Cl.C(Cl)(Cl)Cl |
| Title of publication | Reversible Formation and Transmetalation of Schiff-Base Complexes in Subcomponent Self-Assembly Reactions. |
| Authors of publication | Lewing, Dennis; Koppetz, Hannah; Hahn, F. Ekkehardt |
| Journal of publication | Inorganic chemistry |
| Year of publication | 2015 |
| Journal volume | 54 |
| Journal issue | 15 |
| Pages of publication | 7653 - 7659 |
| a | 9.8549 ± 0.0004 Å |
| b | 10.5969 ± 0.0004 Å |
| c | 20.2206 ± 0.0008 Å |
| α | 90° |
| β | 94.607 ± 0.001° |
| γ | 90° |
| Cell volume | 2104.84 ± 0.14 Å3 |
| Cell temperature | 153 ± 2 K |
| Ambient diffraction temperature | 153 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0537 |
| Residual factor for significantly intense reflections | 0.046 |
| Weighted residual factors for significantly intense reflections | 0.1253 |
| Weighted residual factors for all reflections included in the refinement | 0.1301 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.119 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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