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Information card for entry 4345133
Preview
| Coordinates | 4345133.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C6 H4 Bi I4 S4 |
|---|---|
| Calculated formula | C6 H4 Bi I4 S4 |
| Title of publication | Mono- and Mixed-Valence Tetrathiafulvalene Semiconductors (TTF)BiI4 and (TTF)4BiI6 with 1D and 0D Bismuth-Iodide Networks. |
| Authors of publication | Evans, Hayden A.; Labram, John G.; Smock, Sara R.; Wu, Guang; Chabinyc, Michael L.; Seshadri, Ram; Wudl, Fred |
| Journal of publication | Inorganic chemistry |
| Year of publication | 2017 |
| Journal volume | 56 |
| Journal issue | 1 |
| Pages of publication | 395 - 401 |
| a | 7.6774 ± 0.0009 Å |
| b | 31.819 ± 0.004 Å |
| c | 14.1598 ± 0.0016 Å |
| α | 90° |
| β | 104.535 ± 0.002° |
| γ | 90° |
| Cell volume | 3348.3 ± 0.7 Å3 |
| Cell temperature | 296 ± 2 K |
| Ambient diffraction temperature | 296 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 9 |
| Hermann-Mauguin space group symbol | C 1 c 1 |
| Hall space group symbol | C -2yc |
| Residual factor for all reflections | 0.0365 |
| Residual factor for significantly intense reflections | 0.0357 |
| Weighted residual factors for significantly intense reflections | 0.0898 |
| Weighted residual factors for all reflections included in the refinement | 0.0904 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.012 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/4345133.html
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