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Information card for entry 4502650
Preview
| Coordinates | 4502650.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C30 H29 Cl N4 Ni O12 |
|---|---|
| Calculated formula | C30 H29 Cl N4 Ni O12 |
| SMILES | [Ni]12([n]3ccccc3c3cccc[n]13)([n]1ccccc1c1cccc[n]21)([OH2])Cl.c1(c(cc(c(c1)C(=O)O)C(=O)O)C(=O)[O-])C(=O)O.O.O.O |
| Title of publication | Visible Concentration-Sensitive Structural Transformation |
| Authors of publication | Sun, Ming-Ling; Zhang, Lei; Lin, Qi-Pu; Zhang, Jian; Yao, Yuan-Gen |
| Journal of publication | Crystal Growth & Design |
| Year of publication | 2010 |
| Journal volume | 10 |
| Journal issue | 4 |
| Pages of publication | 1464 |
| a | 9.8074 ± 0.0018 Å |
| b | 12.558 ± 0.003 Å |
| c | 14.492 ± 0.003 Å |
| α | 99.228 ± 0.012° |
| β | 106.804 ± 0.009° |
| γ | 110.289 ± 0.008° |
| Cell volume | 1533.6 ± 0.6 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0518 |
| Residual factor for significantly intense reflections | 0.0399 |
| Weighted residual factors for significantly intense reflections | 0.0836 |
| Weighted residual factors for all reflections included in the refinement | 0.0913 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.013 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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