Information card for entry 4507441
| Common name |
3,10-DPhDNTT |
| Chemical name |
3,10-DPhDNTT |
| Formula |
C34 H20 S2 |
| Calculated formula |
C34 H20 S2 |
| SMILES |
c12c(c3c(c4c(s3)cc3c(c4)cc(cc3)c3ccccc3)s1)cc1cc(ccc1c2)c1ccccc1 |
| Title of publication |
Diphenyl Derivatives of Dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene: Organic Semiconductors for Thermally Stable Thin-Film Transistors. |
| Authors of publication |
Kang, Myeong Jin; Miyazaki, Eigo; Osaka, Itaru; Takimiya, Kazuo; Nakao, Akiko |
| Journal of publication |
ACS applied materials & interfaces |
| Year of publication |
2013 |
| Journal volume |
5 |
| Journal issue |
7 |
| Pages of publication |
2331 - 2336 |
| a |
6.9888 ± 0.0003 Å |
| b |
46.665 ± 0.009 Å |
| c |
7.18 ± 0.0004 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
2341.6 ± 0.5 Å3 |
| Cell temperature |
200 ± 2 K |
| Ambient diffraction temperature |
200 ± 2 K |
| Number of distinct elements |
3 |
| Space group number |
61 |
| Hermann-Mauguin space group symbol |
P b c a |
| Hall space group symbol |
-P 2ac 2ab |
| Residual factor for all reflections |
0.0698 |
| Residual factor for significantly intense reflections |
0.0594 |
| Weighted residual factors for significantly intense reflections |
0.1608 |
| Weighted residual factors for all reflections included in the refinement |
0.1651 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.338 |
| Diffraction radiation wavelength |
1 Å |
| Diffraction radiation type |
synchrotron |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/4507441.html