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Information card for entry 4510234
Preview
| Coordinates | 4510234.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | Cd I6 Tl4 |
|---|---|
| Calculated formula | Cd I6 Tl4 |
| SMILES | I[Cd](I)([I-])([I-])([I-])[I-].[Tl+].[Tl+].[Tl+].[Tl+] |
| Title of publication | Crystal Growth of Tl4CdI6: A Wide Band Gap Semiconductor for Hard Radiation Detection |
| Authors of publication | Wang, Shichao; Liu, Zhifu; Peters, John A.; Sebastian, Maria; Nguyen, Sandy L.; Malliakas, Christos D.; Stoumpos, Constantinos C.; Im, Jino; Freeman, Arthur J.; Wessels, Bruce W.; Kanatzidis, Mercouri G. |
| Journal of publication | Crystal Growth & Design |
| Year of publication | 2014 |
| Journal volume | 14 |
| Journal issue | 5 |
| Pages of publication | 2401 |
| a | 9.2288 ± 0.0004 Å |
| b | 9.2288 ± 0.0004 Å |
| c | 9.6054 ± 0.0006 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 818.1 ± 0.07 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 3 |
| Space group number | 128 |
| Hermann-Mauguin space group symbol | P 4/m n c |
| Hall space group symbol | -P 4 2n |
| Residual factor for all reflections | 0.0401 |
| Residual factor for significantly intense reflections | 0.0315 |
| Weighted residual factors for significantly intense reflections | 0.0599 |
| Weighted residual factors for all reflections included in the refinement | 0.062 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.211 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4510234.html
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