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Information card for entry 4511533
Preview
| Coordinates | 4511533.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C12 H9 Br3 N O2 Sn |
|---|---|
| Calculated formula | C14 H12 Br3 N3 O Sn |
| SMILES | [Sn]12(Br)(Br)(Br)Oc3c([N]2=Cc2[n]1cccc2)cccc3.N#CC |
| Title of publication | Subtle C‒H···Hal (Hal = Cl, Br) Bonding as Predominant Synthon in the Assembly of Supramolecular Architectures Based on Luminescent Tin(IV) Complexes. Crystallography, Hirshfeld Surfaces, DFT Calculations, and Fluorescence |
| Authors of publication | Guzmán-Percástegui, Edmundo; Alvarado-Rodríguez, José G.; Cruz-Borbolla, Julián; Andrade-López, Noemí; Vázquez-García, Rosa A.; Nava-Galindo, Rigo N.; Pandiyan, Thangarasu |
| Journal of publication | Crystal Growth & Design |
| Year of publication | 2014 |
| Journal volume | 14 |
| Journal issue | 8 |
| Pages of publication | 3742 |
| a | 8.5178 ± 0.0003 Å |
| b | 20.4772 ± 0.0007 Å |
| c | 10.4144 ± 0.0004 Å |
| α | 90° |
| β | 93.75 ± 0.003° |
| γ | 90° |
| Cell volume | 1812.6 ± 0.11 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.056 |
| Residual factor for significantly intense reflections | 0.0414 |
| Weighted residual factors for significantly intense reflections | 0.0908 |
| Weighted residual factors for all reflections included in the refinement | 0.0973 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.049 |
| Diffraction radiation wavelength | 0.7107 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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