Information card for entry 4513167
| Formula |
C25 H33 N O6 S |
| Calculated formula |
C25 H33 N O6 S |
| SMILES |
S(=O)(=O)([O-])C.[NH+]1(CCC(CC1)CC1Cc2cc(c(cc2C1=O)OC)OC)Cc1ccccc1 |
| Title of publication |
Sulfonic Acid Salts of Donepezil and Stabilization of Amorphous Donepezil via Formation of Amorphous Salts |
| Authors of publication |
Lee, Sun Hye; Bae, Jae Ho; Park, Yeojin; Adhikari, Bishal Raj; Mao, Chen; Kim, Daeyoung; Kim, Kyung Im; Kang, Sung Kwon; Lee, Eun Hee |
| Journal of publication |
Crystal Growth & Design |
| Year of publication |
2015 |
| Journal volume |
15 |
| Journal issue |
7 |
| Pages of publication |
3123 |
| a |
15.1035 ± 0.0003 Å |
| b |
9.3287 ± 0.0002 Å |
| c |
34.9631 ± 0.0006 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
4926.16 ± 0.17 Å3 |
| Cell temperature |
173 ± 2 K |
| Ambient diffraction temperature |
173 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
33 |
| Hermann-Mauguin space group symbol |
P n a 21 |
| Hall space group symbol |
P 2c -2n |
| Residual factor for all reflections |
0.0721 |
| Residual factor for significantly intense reflections |
0.0561 |
| Weighted residual factors for significantly intense reflections |
0.1251 |
| Weighted residual factors for all reflections included in the refinement |
0.1334 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.035 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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