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Information card for entry 4516603
Preview
| Coordinates | 4516603.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C72 H94 N8 O4 Si |
|---|---|
| Calculated formula | C72 H94 N8 O4 Si |
| SMILES | [Si]123(n4c5=Nc6[n]3c(=Nc3c7c(c(N=c8[n]2c(N=c4c2c5cccc2)c2c8cccc2)n13)cccc7)c1c6cccc1)(OC(=O)CCCCCCCCCCCCCCCCCCC)OC(=O)CCCCCCCCCCCCCCCCCCC |
| Title of publication | Solution-Processable Silicon Phthalocyanines in Electroluminescent and Photovoltaic Devices. |
| Authors of publication | Zysman-Colman, Eli; Ghosh, Sanjay S.; Xie, Guohua; Varghese, Shinto; Chowdhury, Mithun; Sharma, Nidhi; Cordes, David B.; Slawin, Alexandra M. Z.; Samuel, Ifor D. W. |
| Journal of publication | ACS applied materials & interfaces |
| Year of publication | 2016 |
| Journal volume | 8 |
| Journal issue | 14 |
| Pages of publication | 9247 - 9253 |
| a | 9.1436 ± 0.0015 Å |
| b | 12.0015 ± 0.0017 Å |
| c | 15.84 ± 0.003 Å |
| α | 67.934 ± 0.009° |
| β | 82.349 ± 0.012° |
| γ | 77.354 ± 0.012° |
| Cell volume | 1569.3 ± 0.5 Å3 |
| Cell temperature | 93 K |
| Ambient diffraction temperature | 93 K |
| Number of distinct elements | 5 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.055 |
| Residual factor for significantly intense reflections | 0.0396 |
| Weighted residual factors for significantly intense reflections | 0.1031 |
| Weighted residual factors for all reflections included in the refinement | 0.1107 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.011 |
| Diffraction radiation wavelength | 0.71075 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
For the version history of this entry, please navigate to main COD server.
The link is: https://www.crystallography.net/4516603.html
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Users of the data should acknowledge the original authors of the
structural data.