Information card for entry 4517454
| Formula |
C104.5 H98 N4 S3 |
| Calculated formula |
C104.5 H98 N4 S3 |
| Title of publication |
Three-Dimensional Spirothienoquinoline-Based Small Molecules for Organic Photovoltaic and Organic Resistive Memory Applications. |
| Authors of publication |
Li, Panpan; Chan, Chin-Yiu; Lai, Shiu-Lun; Chan, Hing; Leung, Ming-Yi; Hong, Eugene Yau-Hin; Li, Jingwen; Wu, Hongbin; Chan, Mei-Yee; Yam, Vivian Wing-Wah |
| Journal of publication |
ACS applied materials & interfaces |
| Year of publication |
2020 |
| Journal volume |
12 |
| Journal issue |
10 |
| Pages of publication |
11865 - 11875 |
| a |
16.045 ± 0.003 Å |
| b |
34.887 ± 0.007 Å |
| c |
16.55 ± 0.003 Å |
| α |
90° |
| β |
114.68 ± 0.03° |
| γ |
90° |
| Cell volume |
8418 ± 3 Å3 |
| Cell temperature |
100 ± 2 K |
| Ambient diffraction temperature |
100 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
4 |
| Hermann-Mauguin space group symbol |
P 1 21 1 |
| Hall space group symbol |
P 2yb |
| Residual factor for all reflections |
0.0679 |
| Residual factor for significantly intense reflections |
0.0647 |
| Weighted residual factors for significantly intense reflections |
0.1759 |
| Weighted residual factors for all reflections included in the refinement |
0.1813 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.042 |
| Diffraction radiation wavelength |
0.71 Å |
| Diffraction radiation type |
synchrotron |
| Has coordinates |
Yes |
| Has disorder |
Yes |
| Has Fobs |
No |
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The link is:
https://www.crystallography.net/4517454.html
