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Information card for entry 7004008
Preview
| Coordinates | 7004008.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C24 H56 N2 Ni P4 Se4 |
|---|---|
| Calculated formula | C24 H56 N2 Ni P4 Se4 |
| SMILES | C(C)(C)P1(C(C)C)=NP(C(C)C)(C(C)C)=[Se][Ni]2([Se]1)[Se]=P(C(C)C)(C(C)C)N=P(C(C)C)(C(C)C)[Se]2 |
| Title of publication | Ligand influence on the formation of P/Se semiconductor materials from metal‒organic complexes |
| Authors of publication | Panneerselvam, Arunkumar; Nguyen, Chinh Q.; Waters, John; Malik, Mohammad A.; O'Brien, Paul; Raftery, James; Helliwell, Madeleine |
| Journal of publication | Dalton Transactions |
| Year of publication | 2008 |
| Journal issue | 33 |
| Pages of publication | 4499 - 4506 |
| a | 9.2888 ± 0.0013 Å |
| b | 12.9132 ± 0.0018 Å |
| c | 16.302 ± 0.002 Å |
| α | 79.058 ± 0.002° |
| β | 78.221 ± 0.002° |
| γ | 69.895 ± 0.002° |
| Cell volume | 1782.3 ± 0.4 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 2 |
| Hermann-Mauguin space group symbol | P -1 |
| Hall space group symbol | -P 1 |
| Residual factor for all reflections | 0.0637 |
| Residual factor for significantly intense reflections | 0.0475 |
| Weighted residual factors for significantly intense reflections | 0.0995 |
| Weighted residual factors for all reflections included in the refinement | 0.1051 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.074 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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