Information card for entry 7006580

Structure parameters

• Formula: C15 H45 Cl N6 Si3 Zr
• Calculated formula: C15 H45 Cl N6 Si3 Zr
• SMILES: [Zr]123(Cl)(N([Si](C)(C)C)[N]1(C)C)(N([Si](C)(C)C)[N]2(C)C)N([Si](C)(C)C)[N]3(C)C
• Title of publication: Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: potential precursors for metal nitride MOCVD.
• Authors of publication: Baunemann, Arne; Kim, Younsoo; Winter, Manuela; Fischer, Roland A.
• Journal of publication: Dalton transactions (Cambridge, England : 2003)
• Year of publication: 2006
• Journal issue: 1
• Pages of publication: 121 - 128
• a: 18.019 ± 0.008 Å
• b: 10.197 ± 0.006 Å
• c: 15.69 ± 0.007 Å
• α: 90°
• β: 94.83 ± 0.04°
• γ: 90°
• Cell volume: 2873 ± 2 ų
• Cell temperature: 100 ± 2 K
• Ambient diffraction temperature: 100 ± 2 K
• Number of distinct elements: 6
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/c 1
• Hall space group symbol: -P 2ybc
• Residual factor for all reflections: 0.1009
• Residual factor for significantly intense reflections: 0.0551
• Weighted residual factors for significantly intense reflections: 0.1383
• Weighted residual factors for all reflections included in the refinement: 0.1535
• Goodness-of-fit parameter for all reflections included in the refinement: 0.983
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No