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Information card for entry 7012568
Preview
| Coordinates | 7012568.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H54 Ga2 I2 Si6 |
|---|---|
| Calculated formula | C20 H54 Ga2 I2 Si6 |
| SMILES | I[Ga](C([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C)[Ga](I)C([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C |
| Title of publication | Ga2I2[C(SiMe3)3]2 ‒ an organogallium(ii) halide containing a Ga‒Ga single bond |
| Authors of publication | Uhl, Werner; El-Hamdan, Abdelhakim; Prött, Malte; Spuhler, Philipp; Frenking, Gernot |
| Journal of publication | Dalton Transactions |
| Year of publication | 2003 |
| Journal issue | 7 |
| Pages of publication | 1360 |
| a | 9.308 ± 0.001 Å |
| b | 15.405 ± 0.002 Å |
| c | 25.564 ± 0.003 Å |
| α | 90° |
| β | 96.95 ± 0.01° |
| γ | 90° |
| Cell volume | 3638.7 ± 0.8 Å3 |
| Cell temperature | 193 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.069 |
| Residual factor for significantly intense reflections | 0.0456 |
| Weighted residual factors for significantly intense reflections | 0.1049 |
| Weighted residual factors for all reflections included in the refinement | 0.1163 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.013 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7012568.html
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