Information card for entry 7013146

Structure parameters

• Formula: C66 H54 F6 N4 O5 P Ru2
• Calculated formula: C66 H54 F6 N4 O5 P Ru2
• SMILES: [Ru]12(O[Ru]34(OC(Cc5[n]4c(ccc5)CC(O3)(c3ccccc3)c3ccccc3)(c3ccccc3)c3ccccc3)#N)(OC(Cc3[n]2c(ccc3)CC(O1)(c1ccccc1)c1ccccc1)(c1ccccc1)c1ccccc1)#N.[P](F)(F)(F)(F)(F)[F-]
• Title of publication: Nitrido-ruthenium(vi) and -osmium(vi) complexes of multianionic chelating (N, O) ligands. Reactions with nucleophiles, electrophiles and oxidizing agentsElectronic supplementary information (ESI) available: Fig. S1?S6. See http://www.rsc.org/suppdata/dt/b3/b304920p/
• Authors of publication: Yip, Ka-Lai; Yu, Wing-Yiu; Chan, Pui-Ming; Zhu, Nian-Yong; Che, Chi-Ming
• Journal of publication: Dalton Transactions
• Year of publication: 2003
• Journal issue: 18
• Pages of publication: 3556
• a: 17.8677 ± 0.0003 Å
• b: 19.0282 ± 0.0002 Å
• c: 18.813 ± 0.0003 Å
• α: 90°
• β: 107.1 ± 0.001°
• γ: 90°
• Cell volume: 6113.48 ± 0.16 ų
• Cell temperature: 295 ± 2 K
• Ambient diffraction temperature: 295 ± 2 K
• Number of distinct elements: 7
• Space group number: 14
• Hermann-Mauguin space group symbol: P 1 21/n 1
• Hall space group symbol: -P 2yn
• Residual factor for all reflections: 0.0799
• Residual factor for significantly intense reflections: 0.0465
• Weighted residual factors for all reflections: 0.1288
• Weighted residual factors for significantly intense reflections: 0.1115
• Goodness-of-fit parameter for all reflections: 1.047
• Goodness-of-fit parameter for significantly intense reflections: 1.09
• Diffraction radiation wavelength: 0.71073 Å
• Diffraction radiation type: MoKα
• Has coordinates: Yes
• Has disorder: No
• Has Fobs: No