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Information card for entry 7019681
Preview
| Coordinates | 7019681.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C36 H60 Al2 P2 |
|---|---|
| Calculated formula | C36 H60 Al2 P2 |
| SMILES | c1([P@@]2(/C(=C\C(C)(C)C)[Al](CC)(CC)[P@@](c3ccccc3)(/C([Al]2(CC)CC)=C\C(C)(C)C)CC)CC)ccccc1 |
| Title of publication | Dimeric aluminum-phosphorus compounds as masked frustrated Lewis pairs for small molecule activation. |
| Authors of publication | Roters, Steffi; Appelt, Christian; Westenberg, Hauke; Hepp, Alexander; Slootweg, J. Chris; Lammertsma, Koop; Uhl, Werner |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2012 |
| Journal volume | 41 |
| Journal issue | 30 |
| Pages of publication | 9033 - 9045 |
| a | 10.2266 ± 0.0001 Å |
| b | 19.49 ± 0.0002 Å |
| c | 9.6615 ± 0.0001 Å |
| α | 90° |
| β | 109.275 ± 0.001° |
| γ | 90° |
| Cell volume | 1817.75 ± 0.03 Å3 |
| Cell temperature | 153 ± 2 K |
| Ambient diffraction temperature | 153 ± 2 K |
| Number of distinct elements | 4 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0409 |
| Residual factor for significantly intense reflections | 0.0376 |
| Weighted residual factors for significantly intense reflections | 0.1059 |
| Weighted residual factors for all reflections included in the refinement | 0.108 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.063 |
| Diffraction radiation wavelength | 1.54178 Å |
| Diffraction radiation type | CuKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7019681.html
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