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Information card for entry 7020394
Preview
| Coordinates | 7020394.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C20 H14 N2 O4.5 V |
|---|---|
| Calculated formula | C20 H14 N2 O4.5 V |
| SMILES | O.O.[V]123(Oc4c(cccc4)C=[N]3c3c([N]2=Cc2c(O1)cccc2)cccc3)=O |
| Title of publication | Oxovanadium(iv)-catalysed oxidation of dibenzothiophene and 4,6-dimethyldibenzothiophene. |
| Authors of publication | Ogunlaja, Adeniyi S.; Chidawanyika, Wadzanai; Antunes, Edith; Fernandes, Manuel A.; Nyokong, Tebello; Torto, Nelson; Tshentu, Zenixole R. |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2012 |
| Journal volume | 41 |
| Journal issue | 45 |
| Pages of publication | 13908 - 13918 |
| a | 19.8921 ± 0.0005 Å |
| b | 6.8805 ± 0.0002 Å |
| c | 27.6507 ± 0.0007 Å |
| α | 90° |
| β | 108.493 ± 0.002° |
| γ | 90° |
| Cell volume | 3589.06 ± 0.17 Å3 |
| Cell temperature | 293 ± 2 K |
| Ambient diffraction temperature | 293 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.088 |
| Residual factor for significantly intense reflections | 0.0448 |
| Weighted residual factors for significantly intense reflections | 0.0968 |
| Weighted residual factors for all reflections included in the refinement | 0.111 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.896 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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