Information card for entry 7022239
| Formula |
C30 H55 N Si5 |
| Calculated formula |
C30 H55 N Si5 |
| SMILES |
[SiH]1(C([Si](C)(C)C)([Si](C)(C)C)CCC1([Si](C)(C)C)[Si](C)(C)C)N(Cc1ccccc1)Cc1ccccc1 |
| Title of publication |
Diverse reactivity of an isolable dialkylsilylene toward imines. |
| Authors of publication |
Chen, Weifeng; Wang, Liliang; Li, Zhifang; Lin, Aiqin; Lai, Guoqiao; Xiao, Xuqiong; Deng, Yuan; Kira, Mitsuo |
| Journal of publication |
Dalton transactions (Cambridge, England : 2003) |
| Year of publication |
2013 |
| Journal volume |
42 |
| Journal issue |
5 |
| Pages of publication |
1872 - 1878 |
| a |
11.4647 ± 0.0008 Å |
| b |
11.7712 ± 0.0009 Å |
| c |
14.2938 ± 0.0011 Å |
| α |
74.147 ± 0.001° |
| β |
82.135 ± 0.001° |
| γ |
69.523 ± 0.001° |
| Cell volume |
1736.6 ± 0.2 Å3 |
| Cell temperature |
296 ± 2 K |
| Ambient diffraction temperature |
296 ± 2 K |
| Number of distinct elements |
4 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0393 |
| Residual factor for significantly intense reflections |
0.034 |
| Weighted residual factors for significantly intense reflections |
0.1105 |
| Weighted residual factors for all reflections included in the refinement |
0.1298 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.096 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7022239.html