Information card for entry 7023561
| Formula |
C16 H15 Cu N7 O7 |
| Calculated formula |
C16 H15 Cu N7 O7 |
| SMILES |
c1ccc2c3c4c(cc2)ccc2[n]4[Cu]([n]13)([n]1c(ccn21)N)([OH]C)ON(=O)=O.N(=O)(=O)[O-] |
| Title of publication |
π-π Stacking, spin density and magnetic coupling strength. |
| Authors of publication |
Chi, Yan-Hui; Shi, Jing-Min; Li, Hong-Nan; Wei, Wei; Cottrill, Ethan; Pan, Ning; Chen, Hu; Liang, Yuan; Yu, Li; Zhang, Yi-Quan; Hou, Chao |
| Journal of publication |
Dalton transactions (Cambridge, England : 2003) |
| Year of publication |
2013 |
| Journal volume |
42 |
| Journal issue |
44 |
| Pages of publication |
15559 - 15569 |
| a |
9.188 ± 0.012 Å |
| b |
9.476 ± 0.012 Å |
| c |
12.122 ± 0.015 Å |
| α |
69.245 ± 0.017° |
| β |
85.18 ± 0.018° |
| γ |
73.112 ± 0.015° |
| Cell volume |
944 ± 2 Å3 |
| Cell temperature |
298 ± 2 K |
| Ambient diffraction temperature |
298 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
2 |
| Hermann-Mauguin space group symbol |
P -1 |
| Hall space group symbol |
-P 1 |
| Residual factor for all reflections |
0.0666 |
| Residual factor for significantly intense reflections |
0.0531 |
| Weighted residual factors for significantly intense reflections |
0.137 |
| Weighted residual factors for all reflections included in the refinement |
0.1442 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.019 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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