Information card for entry 7028313
| Formula |
C26 H33 N13 Ni2 O3 |
| Calculated formula |
C26 H33 N13 Ni2 O3 |
| SMILES |
[Ni]123([OH2])([O]4[Ni]5([OH2])([N](=Cc6c4c(cc(C(C)(C)C)c6)C=[N]1CCc1[n]2cccc1)CCc1[n]5cccc1)([N]3=N#N)N=N#N)N=N#N |
| Title of publication |
A radical pathway in catecholase activity with nickel(II) complexes of phenol based "end-off" compartmental ligands. |
| Authors of publication |
Ghosh, Totan; Adhikary, Jaydeep; Chakraborty, Prateeti; Sukul, Pradip K.; Jana, Mahendra Sekhar; Mondal, Tapan Kumar; Zangrando, Ennio; Das, Debasis |
| Journal of publication |
Dalton transactions (Cambridge, England : 2003) |
| Year of publication |
2014 |
| Journal volume |
43 |
| Journal issue |
2 |
| Pages of publication |
841 - 852 |
| a |
13.907 ± 0.002 Å |
| b |
17.381 ± 0.003 Å |
| c |
13.59 ± 0.004 Å |
| α |
90° |
| β |
111.907 ± 0.002° |
| γ |
90° |
| Cell volume |
3047.7 ± 1.1 Å3 |
| Cell temperature |
293 ± 2 K |
| Ambient diffraction temperature |
293 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
9 |
| Hermann-Mauguin space group symbol |
C 1 c 1 |
| Hall space group symbol |
C -2yc |
| Residual factor for all reflections |
0.0319 |
| Residual factor for significantly intense reflections |
0.0295 |
| Weighted residual factors for significantly intense reflections |
0.0682 |
| Weighted residual factors for all reflections included in the refinement |
0.0692 |
| Goodness-of-fit parameter for all reflections included in the refinement |
1.018 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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https://www.crystallography.net/7028313.html