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Information card for entry 7032615
Preview
| Coordinates | 7032615.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Chemical name | alpha,alpha-bis(ethylthio)-o-xylene di(tantalum pentachloride) |
|---|---|
| Formula | C12 H18 Cl10 S2 Ta2 |
| Calculated formula | C12 H18 Cl10 S2 Ta2 |
| SMILES | [Ta](Cl)(Cl)(Cl)(Cl)(Cl)[S](CC)Cc1ccccc1C[S]([Ta](Cl)(Cl)(Cl)(Cl)Cl)CC |
| Title of publication | Niobium(v) and tantalum(v) halide chalcogenoether complexes - towards single source CVD precursors for ME2 thin films. |
| Authors of publication | Benjamin, Sophie L.; Chang, Yao-Pang; Gurnani, Chitra; Hector, Andrew L.; Huggon, Michelle; Levason, William; Reid, Gillian |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2014 |
| Journal volume | 43 |
| Journal issue | 44 |
| Pages of publication | 16640 - 16648 |
| a | 12.437 ± 0.005 Å |
| b | 17.574 ± 0.003 Å |
| c | 11.745 ± 0.002 Å |
| α | 90° |
| β | 98.859 ± 0.007° |
| γ | 90° |
| Cell volume | 2536.5 ± 1.2 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.042 |
| Residual factor for significantly intense reflections | 0.0384 |
| Weighted residual factors for significantly intense reflections | 0.0922 |
| Weighted residual factors for all reflections included in the refinement | 0.0942 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.037 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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