Information card for entry 7041209
| Formula |
C57 H80 Cl P Si |
| Calculated formula |
C57 H80 Cl P Si |
| SMILES |
[SiH](Pc1c(cc(cc1C(C)C)C(C)C)C(C)C)(Cl)c1c(cccc1c1c(cc(cc1C(C)C)C(C)C)C(C)C)c1c(cc(cc1C(C)C)C(C)C)C(C)C.c1ccccc1 |
| Title of publication |
Assembly of NHC-stabilized 2-hydrophosphasilenes from Si(iv) precursors: a Lewis acid-base complex. |
| Authors of publication |
Dhara, Debabrata; Mandal, Debdeep; Maiti, Avijit; Yildiz, Cem B.; Kalita, Pankaj; Chrysochos, Nicolas; Schulzke, Carola; Chandrasekhar, Vadapalli; Jana, Anukul |
| Journal of publication |
Dalton transactions (Cambridge, England : 2003) |
| Year of publication |
2016 |
| Journal volume |
45 |
| Journal issue |
48 |
| Pages of publication |
19290 - 19298 |
| a |
17.664 ± 0.004 Å |
| b |
21.948 ± 0.004 Å |
| c |
26.612 ± 0.005 Å |
| α |
90° |
| β |
90° |
| γ |
90° |
| Cell volume |
10317 ± 4 Å3 |
| Cell temperature |
170 ± 2 K |
| Ambient diffraction temperature |
170 ± 2 K |
| Number of distinct elements |
5 |
| Space group number |
61 |
| Hermann-Mauguin space group symbol |
P b c a |
| Hall space group symbol |
-P 2ac 2ab |
| Residual factor for all reflections |
0.0788 |
| Residual factor for significantly intense reflections |
0.0405 |
| Weighted residual factors for significantly intense reflections |
0.0895 |
| Weighted residual factors for all reflections included in the refinement |
0.1041 |
| Goodness-of-fit parameter for all reflections included in the refinement |
0.785 |
| Diffraction radiation wavelength |
0.71073 Å |
| Diffraction radiation type |
MoKα |
| Has coordinates |
Yes |
| Has disorder |
No |
| Has Fobs |
No |
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