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Information card for entry 7045434
Preview
| Coordinates | 7045434.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C8 H18 Cl4 Mo S2 |
|---|---|
| Calculated formula | C8 H18 Cl4 Mo S2 |
| SMILES | [Mo]1(Cl)(Cl)(Cl)(Cl)[S](C(C)C)CC[S]1C(C)C |
| Title of publication | Synthesis and properties of MoCl<sub>4</sub> complexes with thio- and seleno-ethers and their use for chemical vapour deposition of MoSe<sub>2</sub> and MoS<sub>2</sub> films. |
| Authors of publication | Chang, Yao-Pang; Hector, Andrew L.; Levason, William; Reid, Gillian; Whittam, Joshua |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2018 |
| Journal volume | 47 |
| Journal issue | 7 |
| Pages of publication | 2406 - 2414 |
| a | 8.6773 ± 0.0002 Å |
| b | 9.1092 ± 0.0002 Å |
| c | 19.7049 ± 0.0004 Å |
| α | 90° |
| β | 98.465 ± 0.002° |
| γ | 90° |
| Cell volume | 1540.57 ± 0.06 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/c 1 |
| Hall space group symbol | -P 2ybc |
| Residual factor for all reflections | 0.0259 |
| Residual factor for significantly intense reflections | 0.0256 |
| Weighted residual factors for significantly intense reflections | 0.0575 |
| Weighted residual factors for all reflections included in the refinement | 0.0577 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.224 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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