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Information card for entry 7045436
Preview
| Coordinates | 7045436.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C4 H10 Cl4 Mo S2 |
|---|---|
| Calculated formula | C4 H10 Cl4 Mo S2 |
| SMILES | [Mo]1(Cl)(Cl)(Cl)(Cl)[S](C)CC[S]1C |
| Title of publication | Synthesis and properties of MoCl<sub>4</sub> complexes with thio- and seleno-ethers and their use for chemical vapour deposition of MoSe<sub>2</sub> and MoS<sub>2</sub> films. |
| Authors of publication | Chang, Yao-Pang; Hector, Andrew L.; Levason, William; Reid, Gillian; Whittam, Joshua |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2018 |
| Journal volume | 47 |
| Journal issue | 7 |
| Pages of publication | 2406 - 2414 |
| a | 7.1386 ± 0.0006 Å |
| b | 11.1622 ± 0.0006 Å |
| c | 7.8033 ± 0.0007 Å |
| α | 90° |
| β | 115.913 ± 0.011° |
| γ | 90° |
| Cell volume | 559.27 ± 0.09 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 5 |
| Space group number | 4 |
| Hermann-Mauguin space group symbol | P 1 21 1 |
| Hall space group symbol | P 2yb |
| Residual factor for all reflections | 0.0556 |
| Residual factor for significantly intense reflections | 0.0471 |
| Weighted residual factors for significantly intense reflections | 0.1177 |
| Weighted residual factors for all reflections included in the refinement | 0.1223 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.022 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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The link is: https://www.crystallography.net/7045436.html
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