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Information card for entry 7045440
Preview
| Coordinates | 7045440.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C32 H42 N4 Ni O2 S2 |
|---|---|
| Calculated formula | C32 H42 N4 Ni O2 S2 |
| SMILES | c1c(/C=C/C2=NC(N(C(C)C)C(C)C)=[S][Ni]3(O2)OC(=NC(N(C(C)C)C(C)C)=[S]3)/C=C/c2ccccc2)cccc1 |
| Title of publication | N,N-Disubstituted-N'-acylthioureas as modular ligands for deposition of transition metal sulfides. |
| Authors of publication | Ali, Zahra; Richey, Nathaniel E.; Bock, Duane C.; Abboud, Khalil A.; Akhtar, Javeed; Sher, Muhammad; McElwee-White, Lisa |
| Journal of publication | Dalton transactions (Cambridge, England : 2003) |
| Year of publication | 2018 |
| Journal volume | 47 |
| Journal issue | 8 |
| Pages of publication | 2719 - 2726 |
| a | 14.662 ± 0.002 Å |
| b | 14.662 ± 0.002 Å |
| c | 15.487 ± 0.002 Å |
| α | 90° |
| β | 90° |
| γ | 90° |
| Cell volume | 3329.3 ± 0.8 Å3 |
| Cell temperature | 100 ± 2 K |
| Ambient diffraction temperature | 100 ± 2 K |
| Number of distinct elements | 6 |
| Space group number | 82 |
| Hermann-Mauguin space group symbol | I -4 |
| Hall space group symbol | I -4 |
| Residual factor for all reflections | 0.0225 |
| Residual factor for significantly intense reflections | 0.02 |
| Weighted residual factors for significantly intense reflections | 0.0485 |
| Weighted residual factors for all reflections included in the refinement | 0.0491 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.029 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
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